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oai:ojs.www.eurjchem.com:article/1569 2017-09-30T11:59:49Z eurjchem:ART driver

Nanostructured thin film of iron tin oxide by aerosol assisted chemical vapour deposition using a new ferrocene containing heterobimetallic complex as single-source precursor Saeed, Sohail Khan, Nasir Butcher, Ray Rashid, Naghmana Crystallites X-Ray Diffractometer Iron tin oxide thin film Single-source precursor Heterobimetallic complex Aerosol assisted chemical vapour deposition Aerosol assisted chemical vapour deposition (CVD) is a sophisticated, unique and modern technique which is used to deposit coatings, films, and other related structures from thermally unstable or the involatile precursors at laboratory and large scale productions. A light weight semiconducting and ceramic oxide based coatings on appropriate substrates can be produced at a lower cost by employing chemical vapour deposition method. There is broader choice of chemical precursors and their availability for obtaining high quality thin films at lower cost and the reaction environment is more flexible ranging from low pressure to atmospheric pressure in CVD. New ferrocene containingheterobimetallic precursor, [C58H80Fe2O4Sn2] has been synthesized and characterized by elemental analysis, FT-IR spectroscopy, thermogravimetric analysis and molecular structure was determined by X-ray single crystal analysis. The heterobimetallic complex was used as a single-source precursor for the growth of iron tin oxide thin film by aerosol assisted chemical vapor deposition. The deposited thin film was characterized by X-ray diffractometer, scanning electron microscopy and atomic force microscopy techniques. The average roughness of deposited film at 425 °C from heterobimetallic precursor was in the range of 4.39 nm. The deposited thin film on glass strip was found to have no cracks, excellent adhesion and to be crystalline in nature and free from any carboneous impurities. Atlanta Publishing House LLC 2017-09-30 info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion application/pdf text/plain https://www.eurjchem.com/index.php/eurjchem/article/view/1569 10.5155/eurjchem.8.3.224-228.1569 European Journal of Chemistry; Vol. 8 No. 3 (2017): September 2017; 224-228 2153-2257 2153-2249 eng https://www.eurjchem.com/index.php/eurjchem/article/view/1569/pdf_1569 https://www.eurjchem.com/index.php/eurjchem/article/view/1569/2599